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ST6587 Tantalum Niobium Target (TaNb Target)

Catalog No. ST6587
Material Ta, Nb
Purity 99.95%
Shape Planar Disc

Tantalum Niobium Target (TaNb Target) from Stanford Advanced Materials is a durable and high-performance sputtering material that combines the corrosion resistance and high melting point of tantalum with niobium’s strength and superconducting properties, ideal for advanced thin film deposition in electronic and aerospace applications.

Related Products: Tantalum Sputtering Target, Ta, Tantalum Aluminum Sputtering Target, Ta/Al, Niobium Sputtering Target, Nb, Lithium Niobate Sputtering Target, LiNbO3

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United States

    Purity

    99.9%

    • 99.9%
    • 99.5%
    • 99.99%
    • 99.999%
    • Other
    Diameter

    2''

    • 2''
    • 3''
    • 4''
    • 5''
    • 6''
    • Other
    Thickness

    0.25''

    • 0.25''
    • 0.125''
    • All
    • Other
    Bonding

    Yes

    • Yes
    • No
    • Other
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