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ST0030 Molybdenum (Mo) Sputtering Target

Catalog No. ST0030
Dimensions Customized
Material Mo≥99%, or customized
Density 9.8 - 10.2 g/cm3
Shape Disc, Planar, or Custom-made
Purity ≥99%

Molybdenum sputtering targets are high-purity materials used in thin-film deposition processes for applications such as semiconductors, solar cells, and flat panel displays, offering excellent thermal and electrical conductivity.

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Molybdenum Sputtering Target
Molybdenum Sputtering Target
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United States

    Purity

    99.9%

    • 99.9%
    • 99.5%
    • 99.99%
    • 99.999%
    • Other
    Diameter

    2''

    • 2''
    • 3''
    • 4''
    • 5''
    • 6''
    • Other
    Thickness

    0.25''

    • 0.25''
    • 0.125''
    • All
    • Other
    Bonding

    Yes

    • Yes
    • No
    • Other
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