Discontinued (Discontinued) ST0008 Cerium (Ce) Sputtering Target

Cerium (Ce) Sputtering Target Description

Cerium (Ce) Sputtering Target is engineered to deliver optimal performance in thin film deposition and physical vapor deposition processes. Manufactured with a high purity (≥99%), this target ensures consistent sputtering yields and high-quality film formation under both RF and DC conditions. Its design accommodates both standard discs and custom-made shapes, making it a versatile choice for semiconductor fabrication, optical coatings, and advanced research applications. The robust characteristics of cerium also guarantee durability under challenging processing conditions, ensuring reliable performance in critical applications.

Cerium (Ce) Sputtering Target Specification

Cerium (Ce) Sputtering Target Applications

· Semiconductor Manufacturing: Ideal for depositing uniform thin films in integrated circuits and electronic devices.
· Optical Coatings: Used for precision reflective and anti-reflective coatings in advanced optical applications.
· Microelectronics: Supports the fabrication of high-precision components in sensors, displays, and other devices.
· Research and Development: Widely applied in laboratories exploring advanced material science and nanotechnology.
· Industrial Surface Engineering: Serves various surface modification processes in high-demand industrial operations.

Cerium Sputtering Target Packing

Our products are packaged in customized cartons of various sizes based on the material dimensions. Small items are securely packed in PP boxes, while larger items are placed in custom wooden crates. We ensure strict adherence to packaging customization and the use of appropriate cushioning materials to provide optimal protection during transportation.

Packaging: Carton, Wooden Box, or Customized.

Manufacturing Process

Manufacturing Process

Elemental Analysis Methods

• Metal Element Analysis: Conducted using ICP-OES (Inductively Coupled Plasma Optical Emission Spectrometry).
• Gas Element Analysis: Conducted using LECO analysis

Frequently Asked Questions

Q: What are the primary applications for Cerium (Ce) Sputtering Targets?
A: They are mainly used in semiconductor manufacturing, optical coatings, microelectronics, and advanced material research for thin film deposition.

Q: How do RF and DC sputtering modes benefit the target's performance?
A: The dual-mode sputtering capability allows flexible operational conditions, providing optimal film deposition and uniform sputtering efficiency across various industrial applications.

Q: Can the shape of the sputtering target be customized?
A: Yes, our Cerium (Ce) Sputtering Targets are available as standard discs or can be custom-made to meet specific application requirements.

Q: What level of purity is guaranteed in these sputtering targets?
A: Each target is produced with a purity level of ≥99%, ensuring consistent performance and reliable film deposition.

Q: How is the product packaged to prevent contamination during transportation?
A: The targets are vacuum-sealed in protective packaging, ensuring they remain contamination-free and in optimal condition during storage and shipment.