Discontinued (Discontinued) ST0020 Holmium (Ho) Sputtering Target

Holmium (Ho) Sputtering Target Description

Holmium (Ho) Sputtering Target is produced with a purity of ≥99% and is available in precise disc forms or custom-made shapes to cater to specific industrial requirements. Holmium's unique properties make it valuable in applications that demand exceptional magnetic, optical, and thermal performance. This target ensures uniform deposition and high-quality film formation in advanced coating processes.

Holmium (Ho) Sputtering Target Specification

Holmium (Ho) Sputtering Target Applications

· Thin Film Deposition: Ideal for DC sputtering processes in semiconductor and display fabrication.
· Optical Coatings: Used in the production of high-performance optical filters and lasers.
· Research and Development: Serves as a fundamental material in materials science research for advanced magnetic and electronic properties.
· Specialty Coatings: Applied in niche industries requiring wear-resistant or corrosion-resistant surfaces.
· Industrial Production: Suitable for reproducible and efficient sputtering in various industrial coating systems.

Holmium Sputtering Target Packing

Our products are packaged in customized cartons of various sizes based on the material dimensions. Small items are securely packed in PP boxes, while larger items are placed in custom wooden crates. We ensure strict adherence to packaging customization and the use of appropriate cushioning materials to provide optimal protection during transportation.

Packaging: Carton, Wooden Box, or Customized.

Manufacturing Process

Manufacturing Process

Elemental Analysis Methods

·        Metal Element Analysis: Conducted using ICP-OES (Inductively Coupled Plasma Optical Emission Spectrometry).

·        Gas Element Analysis: Conducted using LECO analysis

Frequently Asked Questions

Q: What is a sputtering target?
A: A sputtering target is a material source used in physical vapor deposition processes where atoms are ejected from the target material and deposited onto a substrate to form thin films.

Q: Why is high purity important for a sputtering target?
A: High purity ensures that the deposited film is free from contaminants, leading to superior performance and reliability in the final application.

Q: Can the Holmium (Ho) Sputtering Target be custom-made?
A: Yes, the available sizes and shapes can be customized to meet specific application requirements.

Q: What industries typically use Holmium (Ho) sputtering targets?
A: They are commonly used in semiconductor manufacturing, optical coatings, research laboratories, and specialty industrial coating applications.

Q: How should the target be stored to maintain its quality?
A: It is recommended to store the target in a clean, dry environment, preferably in its original protective packaging, to prevent contamination and physical damage.