ST0480 Potassium (K) Sputtering Target

Potassium (K) Sputtering Target Description

The Potassium (K) Sputtering Target is engineered for precision and reliability in sputtering deposition processes. Manufactured under stringent quality controls, this target ensures uniform vaporization and consistent film quality across substrates. Its high purity and specialized bonding method guarantee excellent performance in producing high-quality thin films. Suitable for a range of advanced industrial applications, this target meets the demands of modern microelectronics, optical coatings, and research laboratories.

Potassium (K) Sputtering Target Applications

· Thin Film Deposition: Essential for creating uniform coatings in semiconductor and electronics industries.
· Microelectronics: Used in the fabrication of integrated circuits and other micro-scale devices.
· Display Technologies: Ideal for depositing thin films in advanced display and sensor applications.
· Research Laboratories: Provides reliable performance for experimental sputtering applications.
· Custom Coatings: Suited for specialized applications requiring tailored sputtering processes.

Potassium (K) Sputtering Target Packing

The Potassium (K) Sputtering Target is securely packaged to maintain its integrity and purity during storage and transit. Packaging is performed under specialized inert conditions to protect the reactive material from exposure to air and moisture. Custom packaging options are available to meet specific application requirements.

Frequently Asked Questions

Q: What special precautions are required when handling the Potassium (K) Sputtering Target?
A: Due to its high reactivity with air and moisture, it should be handled and stored under inert conditions, typically in an oil or controlled environment.

Q: How is the Potassium (K) Sputtering Target manufactured?
A: It is produced under strict quality controls to ensure high purity and precision, offering options in standard disc shapes or custom-made designs based on application requirements.

Q: Can this target be used in semiconductor thin film deposition?
A: Yes, the target is ideal for thin film deposition processes in semiconductor devices, providing uniform and high-quality coatings.

Q: What does the "Type of Bond" information indicate?
A: It specifies the bonding method using Indium and Elastomer to attach the target securely to the backing plate, ensuring effective heat dissipation during sputtering.

Q: Are custom sizes available for the Potassium (K) Sputtering Target?
A: Yes, the product is available in customized sizes to meet specific application requirements.